Product
- Slot-Type Wet Process Eqpt.
Slot-Type Wet Process Eqpt.
- Single-Wafer Wet Process Eqpt.
Single-Wafer Wet Process Eqpt.
- Auxiliary Eqpt.
Auxiliary Eqpt.
- Dryer
Dryer
- Chamfering Machine
Chamfering Machine
Single-Wafer Wet Process Eqpt.
Semi-Auto Single-Cavity Lithography Plate Cleaning Machine can effectively remove the photoresist residue on the surface of the photoetching plate and clean the surface of the photolithog-raphy plate through immersion, brush cleaning, ACE/IPA rinsing, and megasound cleaning.
The equipment is mainly composed of process chamber, lifting scanning swing arm module, brushing swing arm module, liquid supply and discharge system, air purification and static elimina-tion system, exhaust system, central control system, etc. The pr-ocess chamber can be equipped with brush cleaning, ACE clean-ing,IPA cleaning,mega cleaning,nitrogen purging, nitrogen blow-drying, centrifugal spin-off
and other functions.
產品詳情
? Compatible with a wide range of sizes of lithography plates
? Layered cavity design
? Dry in and dry out processing mode
? Chemical fluids can be recycled
? Low chemical consumption
? Miniaturized design to meet the needs of the laboratory
| Applicable Process | Mask Clean |
| Applicable Size | 4&6 inch,6&8 inch |
| Loadport type | Open Cassette |
| Chemicals | ACE/NMP/EKC/IPA |
| Particle | ≤30ea @0.2μm |
| Frangementation Rate | ≤0.1‰ |
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